Ponte Solutions Featured At Upcoming Industry Events
[ Back ]   [ More News ]   [ Home ]
Ponte Solutions Featured At Upcoming Industry Events

CTO Markosian Joins High-Level DFM Panel Oct. 26 - Company Demos CAA Solution at Si2 OpenAccess Nov. 5

MOUNTAIN VIEW, Calif.—(BUSINESS WIRE)—October 24, 2007—
Ponte Solutions(TM), the bridge between design and manufacturing, today announced its participation in two upcoming industry events. On Friday, Oct. 26, Ponte CTO, Dr. Ara Markosian, will join an expert panel at the 2nd IEEE International Workshop on Design for Manufacturability & Yield (DFM&Y 2007) being held at the Santa Clara Convention Center.

On Monday, Nov. 5, Ponte director of product marketing, Subra Nathan, gives OpenAccess attendees the first look at a new interface between its YA System and the Cadence(R) Virtuoso(R) platform that lets designers efficiently perform Critical Area Analysis (CAA) and repair during layout.

Oct. 26 Panel on Role of DFM Startups

The DFM&Y panel - "From David to Goliath: The Role of Startups in the Evolution of DFM" also includes moderator and organizer, Juan-Antonio Carballo, Argon Venture Partners; Bob Gleason, Luminescent; Frank Schellenberg, Mentor Graphics; Atul Sharan, Cadence; and Clive Wu, Blaze DFM. It will be held on Friday, Oct. 26, 3pm to 5pm, at the Santa Clara Convention Center. For more information: vlsicad.ucsd.edu/DFMY2007/

Ponte Breaks New CAA Demo at OA Conference Nov. 5

On Monday, Nov. 5 at the Si2 OpenAccess Conference, Ponte will provide the initial public demo of interface between YA System and Virtuoso that lets IP designers address CAA in an actionable manner during the creation of IP elements, standard cells, and memories. Ponte's YA System presents the designer with prioritized CAA hot spots, which will ensure the most critical CAA effects as predicted by certified defect kits provided by the leading foundries, are identified and corrected. By interfacing to the Cadence Virtuoso platform via Open Access, Ponte's YA System can be used to analyze and correct CAA issues during design. The Si2 OpenAccess Conference will be held at Sun Microsystems' Santa Clara Conference Center - For more information and directions: www.si2.org/?page=890

About Ponte Solutions

Ponte Solutions, Inc. develops and markets unique model-based software products and design for manufacturing (DFM) solutions that analyze, predict, and reduce the impact of process variability during the manufacture and design of semiconductors. Ponte customers include leading semiconductor companies, foundries, and design houses worldwide. Founded in 2002, the venture-backed company has received funding from The Mayfield Fund, U.S. Venture Partners, Incubic LLC, Silicom Ventures LLC, and others. The company has offices in Mountain View, Calif., and Yerevan, Armenia. For more information about Ponte and its DFM products please visit www.ponte.com.

All trademarks mentioned herein are the property of their respective owners.

Contact:

Ponte Public Relations
Jim Lochmiller, 541-821-3438
Email Contact